Ushbu fayl Vikiomborga yuklangan boʻlib, boshqa loyihalarda ham qoʻllanilishi mumkin.
Uning tavsif sahifasidan olingan maʼlumot quyida keltirilgan.
Qisqa izoh
TaʼrifIon implanter schematic.png
English: Schematics of an mass separating implantation/deposition setup. Ion energy at the substrate is determined by the difference of Uaccell and Udecell. Image created using Tgif.
This image (or all images in this category) uses inside labels or attached captions in a specific script or language and should be converted to a language neutral form. This would allow its use in all Wikimedia projects and, more importantly, all Wikimedia languages.
ulashishga – ishlanmani nusxalash, tarqatish va uzatish
remiks qilishga – ishni moslashtirishga
Quyidagi shartlar asosida:
atribut – Siz tegishli litsenziyaga havolani taqdim etishingiz va oʻzgartirishlar kiritilganligini koʻrsatishingiz kerak. Siz buni har qanday oqilona yoʻl bilan qilishingiz mumkin, lekin litsenziar Sizni yoki Sizning foydalanishingizni ma'qullashini taklif qiladigan tarzda emas.
bir xil ulashish – Agar Siz materialni remiks qilsangiz, oʻzgartirsangiz yoki unga asoslansangiz, oʻz hissalaringizni asl nusxadagi kabi bir xil yoki mos litsenziya ostida tarqatishingiz kerak.
This licensing tag was added to this file as part of the GFDL licensing update.http://creativecommons.org/licenses/by-sa/3.0/CC BY-SA 3.0Creative Commons Attribution-Share Alike 3.0truetrue
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Schematics of an mass separating en:ion implantationimplantation/deposition setup. Ion energy at the substrate is determined by the difference of U<sub>accell</sub> and U<sub>decell</sub>. Image created by user:Dschwen u